Developments in Semiconductor Microlithography IV

Developments in Semiconductor Microlithography IV

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Two, 6 inch aperture, Interferometers for Measuring Photoplate Flatness optical design of the Tropel 9900 Flatness Analyzer is an ... \p FILTER BEAM SPLITTER - SAPPHIRE REFERENCE PIN aquot; n COLLIMATOR -* OBJECTIVE 1 REFERENCE SURFACE PHOTOPLATE cctv a€” agt;r CAMERA Fig . Optical Diagram Light is collected by a condenser lens which has an internal, blocked interference filter.


Title:Developments in Semiconductor Microlithography IV
Author:
Publisher: - 1979
ISBN-13:

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